Erbium silicidation on SiGe for advanced MOS application
Q.F. Daphne Yiew, Y. Setiawan, P.S. Lee, D.Z. ChiVolume:
504
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.09.048
File:
PDF, 415 KB
english, 2006