Integrated process of photoresist trimming and dielectric hard mask etching for sub-50 nm gate patterning
Vladimir Bliznetsov, Rakesh Kumar, Huizhen Lin, Kah-Wee Ang, Won Jong Yoo, Anyan DuVolume:
504
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.09.152
File:
PDF, 241 KB
english, 2006