Fullerene-incorporation for enhancing the electron beam...

Thin Solid Films 2006 Vol. 500; Iss. 1-2

Fullerene-incorporation for enhancing the electron beam resist performance for contact hole patterning and filling

Hsin-Chiang You, Fu-Hsiang Ko, Tan-Fu Lei
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Volume:
500
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.11.040
File:
PDF, 253 KB
english, 2006
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