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The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering
K. Eufinger, E.N. Janssen, H. Poelman, D. Poelman, R. De Gryse, G.B. MarinVolume:
515
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.12.247
File:
PDF, 395 KB
english, 2006