Charge storage in silicon-implanted silicondioxide layers...

Thin Solid Films 2006 Vol. 513; Iss. 1-2

Charge storage in silicon-implanted silicondioxide layers examined by scanning probe microscopy

Reinhard Beyer, Elke Beyreuther, Johannes von Borany, Jörg Weber
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Volume:
513
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2006.02.002
File:
PDF, 517 KB
english, 2006
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