Post deposition annealing of aluminum oxide deposited by...

Post deposition annealing of aluminum oxide deposited by atomic layer deposition using tris(diethylamino)aluminum and water vapor on Si(100)

Rajesh Katamreddy, Ronald Inman, Gregory Jursich, Axel Soulet, Alan Nicholls, Christos Takoudis
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Volume:
515
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2007.02.001
File:
PDF, 713 KB
english, 2007
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