VO2 thin films deposited on silicon substrates from V2O5...

Thin Solid Films 2008 Vol. 516; Iss. 6

VO2 thin films deposited on silicon substrates from V2O5 target: Limits in optical switching properties and modeling

Sébastien Saitzek, Frédéric Guinneton, Guillaume Guirleo, Laurent Sauques, Khalifa Aguir, Jean-Raymond Gavarri
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Volume:
516
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2007.04.129
File:
PDF, 648 KB
english, 2008
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