![](/img/cover-not-exists.png)
Annealing induced phosphorus protrusion into thin-oxide films from heavily phosphorus-doped silicon (100)
Yuichi Sano, W.B. Ying, Yoshitomo Kamiura, Yusuke MizokawaVolume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.07.187
File:
PDF, 913 KB
english, 2008