Polycrystalline AlN films with preferential orientation by...

Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition

G. Sánchez, A. Wu, P. Tristant, C. Tixier, B. Soulestin, J. Desmaison, A. Bologna Alles
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Volume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.09.030
File:
PDF, 1.39 MB
english, 2008
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