Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition
G. Sánchez, A. Wu, P. Tristant, C. Tixier, B. Soulestin, J. Desmaison, A. Bologna AllesVolume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.09.030
File:
PDF, 1.39 MB
english, 2008