Sputter-assisted plasma CVD of wide or narrow optical bandgap amorphous CNx:H films using i-C4H10/N2 supermagnetron plasma
Haruhisa Kinoshita, Ryo Ikuta, Tomuo YamaguchiVolume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.10.017
File:
PDF, 377 KB
english, 2008