Coverage properties of SiNx films prepared by catalytic...

Thin Solid Films 2008 Vol. 516; Iss. 10

Coverage properties of SiNx films prepared by catalytic chemical vapor deposition on trenched substrates below 80 °C

Akira Heya, Toshiharu Minamikawa, Toshikazu Niki, Shigehira Minami, Atsushi Masuda, Hironobu Umemoto, Naoto Matsuo, Hideki Matsumura
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Volume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.11.001
File:
PDF, 580 KB
english, 2008
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