The influence of Si coverage in a chip on layer profile of selectively grown Si1 − xGex layers using RPCVD technique
M. Kolahdouz, R. Ghandi, J. Hållstedt, M. Ösling, R. Wise, Hans Wejtmans, H.H. RadamsonVolume:
517
Year:
2008
Language:
english
Pages:
2
DOI:
10.1016/j.tsf.2008.08.085
File:
PDF, 160 KB
english, 2008