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Localized laser thermal annealing of nanometric SiGe layers protected by a dielectric Bragg mirror
D. Cammilleri, F. Fossard, M. Halbwax, C. Tran Manh, N. Yam, D. Débarre, J. Boulmer, D. BouchierVolume:
517
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2008.08.147
File:
PDF, 341 KB
english, 2008