The preparation of flat H–Si(111) surfaces in 40% NH4F...

Electrochimica Acta 2000 Vol. 45; Iss. 28

The preparation of flat H–Si(111) surfaces in 40% NH4F revisited

Philippe Allongue, Catherine Henry de Villeneuve, Sylvie Morin, Rabah Boukherroub, Danial D.M. Wayner
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Volume:
45
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0013-4686(00)00610-1
File:
PDF, 458 KB
english, 2000
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