Mechanisms of heat and oxygen transfer in silicon melt in...

Journal of Crystal Growth 2002 Vol. 243; Iss. 1

Mechanisms of heat and oxygen transfer in silicon melt in an electromagnetic Czochralski system

Koichi Kakimoto, Akimasa Tashiro, Takashige Shinozaki, Hideo Ishii, Yoshio Hashimoto
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Volume:
243
Year:
2002
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(02)01473-2
File:
PDF, 1.11 MB
english, 2002
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