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Electrical reliability aspects of through the gate implanted MOS structures with thin oxides
M.P.M Jank, M Lemberger, A.J Bauer, L Frey, H RysselVolume:
41
Year:
2001
Language:
english
Pages:
4
DOI:
10.1016/s0026-2714(01)00053-1
File:
PDF, 235 KB
english, 2001