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Early resistance change and stress/electromigration modeling in aluminum interconnects
V. Petrescu, A.J. Mouthaan, W. SchoenmakerVolume:
37
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0026-2714(97)00093-0
File:
PDF, 244 KB
english, 1997