Localized monitoring of electromigration with early...

Microelectronics Reliability 1998 Vol. 38; Iss. 4

Localized monitoring of electromigration with early resistance change measurements

J.V Manca, K Croes, W De Ceuninck, V D'Haeger, J D'Haen, P Depauw, L Tielemans, L De Schepper
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Volume:
38
Year:
1998
Language:
english
Pages:
10
DOI:
10.1016/s0026-2714(97)00191-1
File:
PDF, 532 KB
english, 1998
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