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Interface properties of the Si(1 0 0)–SiO2 system formed by rapid thermal oxidation
B.J O’Sullivan, P.K Hurley, A Mathewson, J.H Das, A.D DanielVolume:
40
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0026-2714(99)00270-x
File:
PDF, 128 KB
english, 2000