Formation of nanocrystalline silicon dots from chlorinated...

Formation of nanocrystalline silicon dots from chlorinated materials by RF plasma-enhanced chemical vapor deposition

Hajime Shirai, Yukihiro Fujimura, Sughoan Jung
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Volume:
407
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(02)00005-6
File:
PDF, 1.08 MB
english, 2002
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