Formation of nanocrystalline silicon dots from chlorinated materials by RF plasma-enhanced chemical vapor deposition
Hajime Shirai, Yukihiro Fujimura, Sughoan JungVolume:
407
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(02)00005-6
File:
PDF, 1.08 MB
english, 2002