Hf1−xSixO2 deposition by metal organic chemical vapor...

Thin Solid Films 2002 Vol. 416; Iss. 1-2

Hf1−xSixO2 deposition by metal organic chemical vapor deposition using the Hf(NEt2)4/SiH(NEt2)3/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Masato Ishikawa, Asako Hoshino, Shigeki Hiiro, Toshie Suzuki, Hideaki Machida
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Volume:
416
Year:
2002
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(02)00705-8
File:
PDF, 362 KB
english, 2002
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