High deposition rate of epitaxial (1 0 0) Iridium film on (1 0 0)YSZ/(1 0 0)Si substrate by RF sputtering deposition
Tran Dang Khoa, Sadayoshi Horii, Susumu HoritaVolume:
419
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(02)00761-7
File:
PDF, 146 KB
english, 2002