Boron diffusion into nitrogen doped silicon films for P+ polysilicon gate structures
Farida Mansour, Ramdane Mahamdi, Laurent Jalabert, Pierre Temple-BoyerVolume:
434
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(03)00468-1
File:
PDF, 296 KB
english, 2003