Deposition of hydrogenated amorphous silicon (a-Si:H) films...

Thin Solid Films 2003 Vol. 437; Iss. 1-2

Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot wire chemical vapor deposition: role of filament temperature

S.R Jadkar, J.V Sali, S.T Kshrisagar, M.G Takwale
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Volume:
437
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(03)00607-2
File:
PDF, 146 KB
english, 2003
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