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Furnace and rapid thermal crystallization of amorphous GexSi1−x and Si for thin film transistors
J.B. Rem, M.C.V. de Leuw, J. Holleman, J.F. VerweijVolume:
296
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(96)09355-8
File:
PDF, 417 KB
english, 1997