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Comparison of Al/SiN/a-Si:H and Al/SiO2/a-Si:H top gate structures under thermal bias stresses
F. Dayoub, J.P. Kleider, D. MencaragliaVolume:
296
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(96)09372-8
File:
PDF, 328 KB
english, 1997