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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition
Hae-Yeol Kim, Ki-Young Lee, Jai-Young LeeVolume:
302
Year:
1997
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(96)09573-9
File:
PDF, 589 KB
english, 1997