Ex situ wafer surface cleaning by HF dipping for low...

Thin Solid Films 1997 Vol. 305; Iss. 1-2

Ex situ wafer surface cleaning by HF dipping for low temperature silicon epitaxy

Hyoun-woo Kim, Rafael Reif
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Volume:
305
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(97)00122-3
File:
PDF, 779 KB
english, 1997
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