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Characterization of SiOxNy films deposited from SiCI4 by remote plasma-enhanced chemical vapor deposition
O Sánchez, M.A Aguilar, C Falcony, J.M Martı́nez-Duart, M Hernández VélezVolume:
317
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(97)00612-3
File:
PDF, 82 KB
english, 1998