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Deposition of silicon oxinitride films from hexamethyldisilizane (HMDS) by PECVD
R González-Luna, M.T Rodrigo, C Jiménez, J.M Martı́nez-DuartVolume:
317
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(97)00650-0
File:
PDF, 149 KB
english, 1998