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Selective area deposition of a-C:H films as masks for anisotropic etching of crystalline silicon in aqueous potassium hydroxide
Alfeu Fissore, Marco AR Alves, Edmundo da Silva Braga, Lucila CescatoVolume:
49
Year:
1998
Language:
english
Pages:
2
DOI:
10.1016/s0042-207x(97)00131-0
File:
PDF, 276 KB
english, 1998