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Analysis of the negative ion characteristics of O2 supermagnetron plasma for submicron etching use
Haruhisa Kinoshita, Masahiro Honda, Toshiaki Tatsuta, Fumio SakiyaVolume:
55
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0042-207x(99)00154-2
File:
PDF, 297 KB
english, 1999