Correlation analysis between pattern and non-pattern wafer...

Correlation analysis between pattern and non-pattern wafer for characterization of shallow trench isolation–chemical–mechanical polishing (STI–CMP) process

Sang-Yong Kim, Yong-Jin Seo
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Volume:
60
Year:
2002
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(01)00694-3
File:
PDF, 656 KB
english, 2002
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