Nanometer scale linewidth control during etching of...

Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas

O Joubert, E Pargon, J Foucher, X Detter, G Cunge, L Vallier
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
69
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(03)00321-6
File:
PDF, 465 KB
english, 2003
Conversion to is in progress
Conversion to is failed