Various properties of sputter-deposited Ta–Ru thin films

Applied Surface Science 2001 / 1 Vol. 169-170

Various properties of sputter-deposited Ta–Ru thin films

Wuu, D.S, Horng, R.H, Chang, C.C, Wu, Y.Y
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Volume:
169-170
Language:
english
Pages:
4
Journal:
Applied Surface Science
DOI:
10.1016/s0169-4332(00)00690-5
Date:
January, 2001
File:
PDF, 158 KB
english, 2001
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