Bubble formation on silicon by helium ion bombardment

Applied Surface Science 2001 / 1 Vol. 169-170

Bubble formation on silicon by helium ion bombardment

Yamauchi, Y., Hirohata, Y., Hino, T., Nishikawa, M.
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Volume:
169-170
Language:
english
Pages:
5
Journal:
Applied Surface Science
DOI:
10.1016/s0169-4332(00)00802-3
Date:
January, 2001
File:
PDF, 491 KB
english, 2001
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