Formation of carbon nanowires by annealing silicon carbide...

Applied Surface Science 2002 Vol. 193; Iss. 1-4

Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering

An Xia, Zhuang Huizhao, Yang Li, Xue Chengshan
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Volume:
193
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(02)00214-3
File:
PDF, 132 KB
english, 2002
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