Electron capture kinetics at AlF3/SiO2 interfaces

Electron capture kinetics at AlF3/SiO2 interfaces

I. Thurzo, T.U. Kampen, D.R.T. Zahn, D. König
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Volume:
212-213
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(03)00043-6
File:
PDF, 288 KB
english, 2003
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