Nucleation and growth of nanocrystalline silicon studied by...

Applied Surface Science 2003 Vol. 216; Iss. 1-4

Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR

Keisuke Sato, Tomio Izumi, Mitsuo Iwase, Yoshiyuki Show, Hiroshi Morisaki, Toshie Yaguchi, Takeo Kamino
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Volume:
216
Year:
2003
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(03)00445-8
File:
PDF, 325 KB
english, 2003
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