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Tantalum nitride films formed by ion beam assisted deposition: analysis of the structure in dependence on the ion irradiation intensity
K Volz, M Kiuchi, W EnsingerVolume:
128-129
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(00)00583-1
File:
PDF, 362 KB
english, 2000