Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode
R. Mientus, K. EllmerVolume:
142-144
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(01)01160-4
File:
PDF, 161 KB
english, 2001