Two-dimensional modeling and optimization of a neutral loop...

Surface and Coatings Technology 2002 Vol. 149; Iss. 2-3

Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma

Yaw Okraku-Yirenkyi, Youl-Moon Sung, Masahisa Otsubo, Chikahisa Honda, Tatsuya Sakoda
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Volume:
149
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(01)01440-2
File:
PDF, 386 KB
english, 2002
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