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Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films
Z. Hubička, G. Pribil, R.J. Soukup, N.J. IannoVolume:
160
Year:
2002
Language:
english
Pages:
10
DOI:
10.1016/s0257-8972(02)00389-4
File:
PDF, 775 KB
english, 2002