Internal stress reduction by incorporation of silicon in...

Internal stress reduction by incorporation of silicon in diamond-like carbon films

Masahito Ban, Takeshi Hasegawa
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Volume:
162
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(02)00572-8
File:
PDF, 121 KB
english, 2003
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