Numerical modelling of the processes of exposure and...

Numerical modelling of the processes of exposure and development in electron beam lithography on high temperature superconductor thin films

Y Gueorguiev, K Vutova, G Mladenov
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Volume:
47
Year:
1998
Language:
english
Pages:
9
DOI:
10.1016/s0378-4754(98)00134-7
File:
PDF, 366 KB
english, 1998
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