Numerical modelling of the processes of exposure and development in electron beam lithography on high temperature superconductor thin films
Y Gueorguiev, K Vutova, G MladenovVolume:
47
Year:
1998
Language:
english
Pages:
9
DOI:
10.1016/s0378-4754(98)00134-7
File:
PDF, 366 KB
english, 1998