ChemInform Abstract: Formation of Al2O3—Ta2O5 Double-Oxide Thin Films by Low-Pressure MOCVD and Evaluation of Their Corrosion Resistances in Acid and Alkali Solutions.
Nobuyoshi Hara, Shintaro Nagata, Noboru Akao, Katsuhisa SugimotoVolume:
30
Year:
1999
Pages:
1
DOI:
10.1002/chin.199920245
File:
PDF, 34 KB
1999