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Comparison of 80-keV D+ Ion Implantation with Thermal D2 Doping in Silica by FTIR and ESR Spectroscopy
MASAKATSU SAEKI, SHIN-ICHI OHNO, ENZO TACHIKAWA, NAOTO AZUMA, TETSUO MIYAZAKI, KENJI FUEKIVolume:
68
Year:
1985
Language:
english
Pages:
5
DOI:
10.1111/j.1151-2916.1985.tb09655.x
File:
PDF, 578 KB
english, 1985