Low-Pressure Chemical Vapor Deposition of α-Si3N4 from SiF4...

Journal of the American Ceramic Society 1992 Vol. 75; Iss. 10

Low-Pressure Chemical Vapor Deposition of α-Si3N4 from SiF4 and NH3: Nucleation and Growth Characteristics

Woo Y. Lee, James R. Strife, Richard D. Veltri
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Volume:
75
Year:
1992
Language:
english
Pages:
6
DOI:
10.1111/j.1151-2916.1992.tb05508.x
File:
PDF, 765 KB
english, 1992
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