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High-Temperature Active Oxidation and Active-to-Passive Transition of Chemically Vapor-Deposited Silicon Nitride in N2–O2 and Ar–O2 Atmospheres
Takayuki Narushima, Takashi Goto, Yoshio Yokoyama, Jun Hagiwara, Yasutaka Iguchi, Toshio HiraiVolume:
77
Year:
1994
Language:
english
Pages:
7
DOI:
10.1111/j.1151-2916.1994.tb04607.x
File:
PDF, 546 KB
english, 1994