Influence of Isothermal Chemical Vapor Deposition and...

Influence of Isothermal Chemical Vapor Deposition and Chemical Vapor Infiltration Conditions on the Deposition Kinetics and Structure of Boron Nitride

Marc Leparoux, Lionel Vandenbulcke, Christian Clinard
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Volume:
82
Year:
1999
Language:
english
Pages:
9
DOI:
10.1111/j.1151-2916.1999.tb01894.x
File:
PDF, 1.21 MB
english, 1999
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